Oxford Instruments (LON:OXIG) Trading Down 0.7% – Time to Sell?

Oxford Instruments plc (LON:OXIG) shares dropped 0.7% on Thursday . The company traded as low as GBX 2,095 ($26.44) and last traded at GBX 2,120 ($26.76). Approximately 52,291 shares changed hands during trading, a decline of 49% from the average daily volume of 103,452 shares. The stock had previously closed at GBX 2,135 ($26.95).

Analyst Upgrades and Downgrades

A number of equities research analysts have recently issued reports on OXIG shares. Shore Capital reissued a “buy” rating on shares of Oxford Instruments in a research note on Wednesday, October 16th. Berenberg Bank decreased their price target on Oxford Instruments from GBX 2,925 ($36.92) to GBX 2,830 ($35.72) and set a “buy” rating on the stock in a research note on Tuesday, November 12th.

Oxford Instruments Trading Down 0.2 %

The company has a debt-to-equity ratio of 12.96, a current ratio of 1.64 and a quick ratio of 1.11. The firm has a market cap of £1.23 billion, a PE ratio of 2,459.30, a price-to-earnings-growth ratio of -3.56 and a beta of 0.96. The company’s 50 day moving average price is GBX 2,078.01 and its 200 day moving average price is GBX 2,265.12.

Oxford Instruments Cuts Dividend

The firm also recently declared a dividend, which will be paid on Friday, January 10th. Shareholders of record on Thursday, November 28th will be paid a GBX 5.10 ($0.06) dividend. The ex-dividend date of this dividend is Thursday, November 28th. This represents a dividend yield of 0.24%. Oxford Instruments’s dividend payout ratio (DPR) is 2,441.86%.

Oxford Instruments Company Profile

Oxford Instruments plc provide scientific technology products and services for academic and commercial organizations worldwide. It operates through three segments: Materials & Characterisation, Research & Discovery, and Service & Healthcare. The company offers atomic force, electron, and Raman microscopy; deposition tools comprising plasma enhanced chemical vapour deposition, chemical vapour deposition, inductively coupled plasma chemical vapour deposition, atomic layer deposition, and ion beam deposition systems; and etch tools, including inductively coupled plasma etching, reactive ion etching, deep silicon etching, atomic layer etching, and ion beam etching systems.